EUV Pellicle Market Size Worth $ 2,157.72 Million By 2034 | CAGR: 14.8%

The global EUV Pellicle market size is expected to reach USD 2,157.72 million by 2034, according to a new study by Polaris Market Research. The report, “EUV Pellicle Market Size, Share, Trends, Industry Analysis Report: By Membrane Material, By Scanner Power/NA Compatibility, By End User, and Region – Market Forecast, 2026–2034” provides detailed analysis of market trends, growth factors, key segments, technology developments, qualification activity, pricing trends, and regional outlook.

The market is expanding as semiconductor manufacturers increase EUV adoption and prepare for higher scanner power and High-NA lithography. Silicon-based membranes remain widely used across established Low-NA EUV production lines, while carbon nanotube pellicles are advancing to meet higher transmittance and power durability requirements.

On September 8, 2026, TSMC, Samsung, Intel, and ASML formed a Large Mask Consortium, pledging a transition to 12-inch photomasks specifically to eliminate the roughly 30 percent throughput penalty High-NA reticle stitching currently imposes. Samsung, TSMC, Intel, ASML, Mitsui Chemicals, and other industry participants are developing technologies and supply strategies around these requirements.

EUV Pellicle Market Report Highlights

• Mitsui Chemicals' Mo/Si design remains the qualified standard for the installed Low-NA base, demonstrated at over 90 percent transmittance and 400W power durability, while Mitsui and South Korea's Freudenberg Sealing Technologies are separately developing carbon nanotube membranes rated above 1,000W, more than double that ceiling.
• Carbon nanotube membranes are opening a path past the power ceiling that has limited silicon-based pellicles since 2016, with Mitsui Chemicals' imec-licensed design rated above 94 percent transmittance and beyond 1,000W durability.
• Japan, South Korea, and Taiwan are pursuing three structurally different EUV pellicle sourcing strategies within Asia Pacific alone: Mitsui Chemicals' incumbent supply from Japan, Samsung's equity-backed domestic suppliers in Korea, and TSMC's full in-house conversion in Taiwan.
• High-NA compatible pellicles are expected to register the fastest growth from 2026 to 2034, driven by increasing deployment of 0.55 NA EUV systems.
• Major players in the market include Mitsui Chemicals, S&S Tech, FST, Canatu, ASML, and other specialized EUV pellicle and semiconductor equipment participants.

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Polaris Market Research has segmented the EUV Pellicle Market report based on membrane material, scanner power/NA compatibility, end user, and region:

By Membrane Material Outlook (Revenue, USD Million, 2021–2034)

• Silicon-Based
  • Polysilicon
  • Mo-Si
  • Metal-Silicide
• Carbon Nanotube (CNT)

By Scanner Power / NA Compatibility Outlook (Revenue, USD Million, 2021–2034)

• Low-NA, 0.33 NA Compatible
• High-NA, 0.55 NA Compatible

By End User Outlook (Revenue, USD Million, 2021–2034)

• Foundries
• Integrated Device Manufacturers
• Mask Shops

By Region Outlook (Revenue – USD Million, 2021–2034)

• North America
  • U.S.
  • Canada
• Europe
  • Germany
  • UK
  • France
  • Italy
  • Spain
  • Russia
  • Netherlands
  • Rest of Europe
• Asia Pacific
  • China
  • India
  • Japan
  • South Korea
  • Indonesia
  • Australia
  • Malaysia
  • Taiwan
  • Rest of Asia Pacific
• Latin America
  • Argentina
  • Brazil
  • Mexico
  • Rest of Latin America
• Middle East & Africa
  • UAE
  • Saudi Arabia
  • Israel
  • South Africa
  • Rest of Middle East & Africa